300 mm


300 mm (12") wafers were introduced in 1995. Over the last few years, we have seen a tremendous increase in 300 mm usage. Nearly all of the major chip manufacturers have already or have plans to build 300 mm fabs and many equipment manufacturers are busy producing new tools to accomodate 12" wafers. All 300 mm wafers are double-side polished and have a notch identical to the notch found on 200 mm wafers. There are many different grades of 300 mm wafers and SVM is happy to be able to accommodate a very wide variety of customers.

If you do not see the specification you are looking for, please
contact SVM to speak with a member of our experienced and knowledgeable sales staff.

300 +/- 0.5 mm

Diameter

300 +/- 0.5 mm

300 +/- 0.5 mm

300 +/- 0.5 mm

300 +/- 0.5 mm

300 +/- 0.5 mm

300 +/- 0.5 mm

P+

300 +/- 0.5 mm

P+

300 +/- 0.5 mm

P+

300 +/- 0.5 mm

Type / Dopant

P/Boron

P/Boron

P/Boron

P/Boron

P/Boron

P/Boron

P/Boron

P/Boron

P/Boron

Orientation

{100} +/- 1º

{100} +/- 1º

{100} +/- 1º

{100} +/- 1º

{100} +/- 1º

{100} +/- 1º

{100} +/- 1º

{100} +/- 1º

{100} +/- 1º

Growth Method

Cz

Cz

Cz

Cz

Cz

Cz

Cz

Cz

Cz

Resistivity

1 - 30 Ω-cm

1 - 30 Ω-cm

1 - 30 Ω-cm

1 - 100 Ω-cm

1 - 100 Ω-cm

1 - 100 Ω-cm

0.005 - 0.02 Ω-cm

0.005 - 0.02 Ω-cm

0.005 - 0.02 Ω-cm

Radial Resistivity Gradient (RRG)

<= 10%

<= 10%

 

 

 

 

 

 

 

Oxygen Concentration

<= 30 ppma

<= 30 ppma

 

 

 

 

 

 

 

Carbon Concentration

<= 1 ppma

<= 1 ppma

 

 

 

 

 

 

 

Surface Metals

<= 1xE10

<= 1xE10

 

 

 

 

 

 

 

Thickness

750 - 800 μm

750 - 800 μm

750 - 800 μm

750 - 800 μm

750 - 800 μm

750 - 800 μm

750 - 800 μm

750 - 800 μm

750 - 800 μm

TTV

<= 2 μm

<= 2 μm

<= 2 μm

<= 2 μm

 

<= 2 μm

<= 2 μm

<= 2 μm

 

GBIR

<= 5 μm

<= 5 μm

 

 

 

 

 

 

 

Site Flatness (STIR)

< 0.25 μm

< 0.25 μm

 

<= 0.13 μm

 

 

 

 

 

Bow/Warp

<= 40 μm

<= 40 μm

 

<= 40 μm

 

 

 

 

 

Front Surface

Polished

Polished

Polished

Polished

Polished

Polished

Polished

Polished

Polished

Back Surface

Polished

Polished

Polished

Polished

Polished

Polished

Polished

Polished

Polished

Particle Count

<= 50@ >= 0.09 μm

<= 50@ >= 0.12 μm

<= 50@ >= 0.16 μm

<= 30@ >= 0.2 μm

 

<= 100@ >= 0.2 μm

<= 50@ >= 0.12 μm

<= 50@ >= 0.16 μm

<= 200@ >= 0.2 μm

Notch

 

SEMI Standard

SEMI Standard

SEMI Standard

SEMI Standard

SEMI Standard

SEMI Standard

SEMI Standard

SEMI Standard